A mesoscopic model of the intermixing during nanoenergetic materials processing
Résumé
A general mesoscopic model for the simulation of thin film vapor deposition applied to energetic materials, specifically bimetallic multilayers, is presented. We describe the set up of this mesoscopic simulator developed in the frame of a multiscale study by implementing data into a set of differential equations. We present numerical results relative to the formation of barrier layers as a result of interdiffusion between successive bimetallic AlNi multilayers. The key role of the vacancies species created during deposition is highlighted.
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