Plasma deposition of catalytic thin films is reviewed in view of highlighting some interesting features. Plasma sputtering, plasma enhanced chemical vapor deposition and plasma enhanced metalorganic chemical vapor deposition and their preferential use in various kinds of catalytic films are described. Fuel cell electrodes, gas sensors and photocatalytic films are emphasized as significant applications. As example, magnetron sputtering deposition is successfully used for growing fuel cell electrodes with high performances. Doping doped TiO2 photocatalysts are deposited using various kinds of plasma depending on the expected film morphology. Gas sensors are well designed when using plasma deposition. Plasma treatment of catalysts offers a suitable alternative to thermal treatments. Finally, associated simulations, especially recent progress in molecular dynamic simulations of catalytic film growth are surveyed. This is a suitable way to understand basic mechanisms of catalytic film growth.