Optimization of SiNX:H films deposited by PECVD for reliability of electronic, microsystems and optical applications - Archive ouverte HAL
Article Dans Une Revue Microelectronics Reliability Année : 2010

Optimization of SiNX:H films deposited by PECVD for reliability of electronic, microsystems and optical applications

E. Herth
  • Fonction : Auteur
Bernard Legrand
L. Buchaillot
N. Rolland

Dates et versions

hal-00549491 , version 1 (22-12-2010)

Identifiants

Citer

E. Herth, Bernard Legrand, L. Buchaillot, N. Rolland, T. Lasri. Optimization of SiNX:H films deposited by PECVD for reliability of electronic, microsystems and optical applications. Microelectronics Reliability, 2010, 50, pp.1103-1106. ⟨10.1016/j.microrel.2010.04.011⟩. ⟨hal-00549491⟩
39 Consultations
0 Téléchargements

Altmetric

Partager

More