Low temperature electron mobility and concentration under the gate of AlGaN/GaN field effect transistors - Archive ouverte HAL Access content directly
Journal Articles Journal of Applied Physics Year : 2006

Low temperature electron mobility and concentration under the gate of AlGaN/GaN field effect transistors

Abstract

High electron mobility field effect transistors were fabricated on AlGaN/GaN heterostructures and their magnetoresistance was measured at 4.2 K up to 10 T with simultaneous modulation of the gate potential. Low and high magnetic field data were used to determine the electron mobility (mu) and concentration (n), respectively, in the gated part of the transistor channel. With these measurements we present a method to determine mu and n under the gate of a transistor, which does not require knowledge of the transistor gate length, access resistance, threshold voltage, or capacitance. We discuss applications of this method for nanometer and ballistic transistors. (c) 2006 American Institute of Physics.

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Dates and versions

hal-00543860 , version 1 (06-12-2010)

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M. Sakowicz, R. Tauk, J. Lusakowski, Antoine Tiberj, Wojciech Knap, et al.. Low temperature electron mobility and concentration under the gate of AlGaN/GaN field effect transistors. Journal of Applied Physics, 2006, 100, pp.113726. ⟨10.1063/1.2353786⟩. ⟨hal-00543860⟩
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