All dry CVD-based resist for advanced lithography processes - Archive ouverte HAL
Communication Dans Un Congrès Année : 2000

All dry CVD-based resist for advanced lithography processes

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hal-00494542 , version 1 (23-06-2010)

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  • HAL Id : hal-00494542 , version 1

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C. Monget, O. Joubert, L. Vallier, T. Weidman. All dry CVD-based resist for advanced lithography processes. 196th Meeting of the Electrochemical Society (ECS), 2000, Toronto, Canada. ⟨hal-00494542⟩
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