Effect of depth etching on Bragg reflectors realized by focused ion beam in Ti:LiNbO3 waveguide - Archive ouverte HAL
Communication Dans Un Congrès Année : 2009

Effect of depth etching on Bragg reflectors realized by focused ion beam in Ti:LiNbO3 waveguide

Résumé

In this paper we have studied effect of depth etching on the Bragg gratings (BGs) realized by Focused Ions Beam. This technique has the advantage to induce a direct waveguide structuring without intermediate media, comparing to traditional methods. A reflectivity of 96% within a window centred at 1550 nm is obtained. The effect of the depth etching on the transmittance and the bandwidth at half maximum is demonstrated.
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Dates et versions

hal-00472314 , version 1 (21-04-2021)

Identifiants

Citer

K. Ghoumid, R. Ferriere, Badr-Eddine Benkelfat, G. Ulliac, R. Salut, et al.. Effect of depth etching on Bragg reflectors realized by focused ion beam in Ti:LiNbO3 waveguide. Photonics North 2009, May 2009, Quebec, Canada. pp.738613, ⟨10.1117/12.839692⟩. ⟨hal-00472314⟩
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