Deposition of La2Zr2O7 Film by Chemical Solution Deposition - Archive ouverte HAL
Article Dans Une Revue Journal of Sol-Gel Science and Technology Année : 2010

Deposition of La2Zr2O7 Film by Chemical Solution Deposition

Résumé

La2Zr2O7 (LZO) formation of bulk powders and of films by Chemical Solution Deposition (CSD) process have been studied using propionates. The treatment involved a one step cycle in the reducing forming gas (Ar-5%H2) to be compatible with Ni-5at%W RABITS. Large amount of residual carbon was found in LZO powders formed in these conditions (10 wt %). The volume fraction of the cube texture in LZO films on Ni-5at%w RABITS was found to be a function of the speed of the gas flown above sample. This phenomenon is discussed in considering the C deposited from the carbon-containing gases emitted during the pyrolysis of the precursor. Using proper conditions (950 °C and the speed of gas of 6.8×10-2 m/s), LZO films with good surface crystallinity could be obtained on Ni-5at%W RABITS as demonstrated by X-ray diffraction, electron backscattered diffraction and RHEED. The existence of residual carbon in oxide films is a common question to films deposited by CSD processes under reducing condition.
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Dates et versions

hal-00466307 , version 1 (23-03-2010)

Identifiants

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Z. M. Yu, Philippe Odier, S. Morlens, P. Chaudouet, Maria Bacia, et al.. Deposition of La2Zr2O7 Film by Chemical Solution Deposition. Journal of Sol-Gel Science and Technology, 2010, 54 (3), pp.363. ⟨10.1007/s10971-010-2204-y⟩. ⟨hal-00466307⟩

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