Sorption and permeation characteristics of hybrid organosilicon thin films deposited by PECVD - Archive ouverte HAL
Article Dans Une Revue Separation and Purification Technology Année : 2003

Sorption and permeation characteristics of hybrid organosilicon thin films deposited by PECVD

Florence Bosc
V. Rouessac
Jean Durand
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Résumé

Thin a-SiOxCyHz film membranes were deposited from hexamethyldisiloxane precursor on ester of cellulose porous substrates at low-frequency plasma conditions. The sorption properties of the films were measured for CH4, C2H6, C3H8, n-C4H10 and i-C4H10 by using a gravimetric method with a quartz microbalance. The gas permeability coefficients were determined by using the constant-volume pressure-increase method. Correlations were established between the physical parameters of the penetrants and the corresponding sorption, permeation and diffusion coefficients observed. (C) 2003 Elsevier Science B.V. All rights reserved.

Dates et versions

hal-00450195 , version 1 (25-01-2010)

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Citer

Florence Bosc, José Sanchez-Marcano, V. Rouessac, Jean Durand. Sorption and permeation characteristics of hybrid organosilicon thin films deposited by PECVD. Separation and Purification Technology, 2003, 32, pp.371-376. ⟨10.1016/S1383-5866(03)00061-3⟩. ⟨hal-00450195⟩
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