Conference Papers
Year : 2007
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https://hal.science/hal-00444241
Submitted on : Wednesday, January 6, 2010-11:23:29 AM
Last modification on : Wednesday, February 8, 2023-5:10:48 PM
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- HAL Id : hal-00444241 , version 1
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Laurianne E. Pichon, Corinne Y. Duluard, Thomas Tillocher, Remi Dussart, Philippe Lefaucheux, et al.. SiOxFy film growth in SiF4/O2 plasma at cryogenic temperature. 18th International Symposium on Plasma Chemistry, Aug 2007, Kyoto, Japan. pp.30P-105. ⟨hal-00444241⟩
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