Communication Dans Un Congrès Année : 2008

Contributions and Limits of Charge Pumping Measurement for Addressing Trap Generation in High-K/SiO2 Dielectric Stacks.

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hal-00392166 , version 1 (05-06-2009)

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  • HAL Id : hal-00392166 , version 1

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M. Rafik, G. Ghibaudo. Contributions and Limits of Charge Pumping Measurement for Addressing Trap Generation in High-K/SiO2 Dielectric Stacks.. IEEE IRPS 2008, Phoenix, Arizona, USA, Apr 2008, Phoenix, United States. ⟨hal-00392166⟩
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