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Conference Papers Year : 2007

Characterisation of silicon nitride thin films used as stressor liners on CMOS FETs

G. Raymond
  • Function : Author
Pascal Morin
  • Function : Author
D.A. Hess
  • Function : Author
M. Braccini
F. Volpi
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Dates and versions

hal-00366988 , version 1 (10-03-2009)

Identifiers

  • HAL Id : hal-00366988 , version 1

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G. Raymond, Pascal Morin, Arnaud Devos, D.A. Hess, M. Braccini, et al.. Characterisation of silicon nitride thin films used as stressor liners on CMOS FETs. Proceedings of the Third International Conference on Innovations on Thin Films Processing and Characterisation, ITFPC07, 2007, Nancy, France. ⟨hal-00366988⟩
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