Conference Papers
Year : 2007
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https://hal.science/hal-00366988
Submitted on : Tuesday, March 10, 2009-11:02:52 AM
Last modification on : Friday, March 24, 2023-2:52:51 PM
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- HAL Id : hal-00366988 , version 1
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G. Raymond, Pascal Morin, Arnaud Devos, D.A. Hess, M. Braccini, et al.. Characterisation of silicon nitride thin films used as stressor liners on CMOS FETs. Proceedings of the Third International Conference on Innovations on Thin Films Processing and Characterisation, ITFPC07, 2007, Nancy, France. ⟨hal-00366988⟩
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