Anomalous diffusion mediated by atom deposition into a porous substrate.
Résumé
Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time.
Domaines
Plasmas| Origine | Fichiers produits par l'(les) auteur(s) |
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