STEM-EELS investigations of Ultra-Low-k dielectrics after chemical mechanical polishing: impact on energy band gap - Archive ouverte HAL
Article Dans Une Revue Under review Microelectronic Engineering Année : 2008

STEM-EELS investigations of Ultra-Low-k dielectrics after chemical mechanical polishing: impact on energy band gap

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hal-00354602 , version 1 (20-01-2009)

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  • HAL Id : hal-00354602 , version 1

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M. Cheynet, S. Pokrant, F. Volpi, M. Aimadeddine, V. Arnal. STEM-EELS investigations of Ultra-Low-k dielectrics after chemical mechanical polishing: impact on energy band gap. Under review Microelectronic Engineering, 2008. ⟨hal-00354602⟩

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