Direct measurements of the energy flux due to chemical reactions at the surface of silicon sample interacting with SF6 plasma - Archive ouverte HAL
Article Dans Une Revue Applied Physics Letters Année : 2008

Direct measurements of the energy flux due to chemical reactions at the surface of silicon sample interacting with SF6 plasma

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Science des matériaux [cond-mat.mtrl-sci] Plasmas

Nadjib Semmar  : Connectez-vous pour contacter le contributeur

https://hal.science/hal-00331673

Soumis le : vendredi 17 octobre 2008-12:06:38

Dernière modification le : mardi 4 juin 2024-11:26:03

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hal-00331673 , version 1 (17-10-2008)

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  • HAL Id : hal-00331673 , version 1

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Remy Dussart, Anne-Lise Thomann, Laurianne E. Pichon, Larbi Bedra, Nadjib Semmar, et al.. Direct measurements of the energy flux due to chemical reactions at the surface of silicon sample interacting with SF6 plasma. Applied Physics Letters, 2008, 93, pp.131502. ⟨hal-00331673⟩

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