Nanostructured Silicon Thin Films Deposited Under Dusty Plasma Conditions
Résumé
Silane-based dusty plasmas are widely used in plasma-enhanced chemical vapor deposition processes to synthesize silicon nanoparticles and/or nanostructured thin films. Under certain conditions, it is possible to access to the inner structure of the thin film by scanning electronmicroscopy, using the “hole” due to dust particles that moved when the sample is brought back to atmospheric pressure.
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