High resolution x-ray diffraction study of strain relaxation mechanisms in thin layers of SmNiO3 heteroepitaxially grown by MOCVD on SrTiO3 single crystals - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2007

High resolution x-ray diffraction study of strain relaxation mechanisms in thin layers of SmNiO3 heteroepitaxially grown by MOCVD on SrTiO3 single crystals

Fichier non déposé

Dates et versions

hal-00287339 , version 1 (11-06-2008)

Identifiants

  • HAL Id : hal-00287339 , version 1

Citer

Florine Conchon, C. Girardot, Alexandre Boulle, S. Pignard, E. Dooryhee, et al.. High resolution x-ray diffraction study of strain relaxation mechanisms in thin layers of SmNiO3 heteroepitaxially grown by MOCVD on SrTiO3 single crystals. Size and Strain V, Oct 2007, Garmish-Partenkirchen, Germany. ⟨hal-00287339⟩
45 Consultations
0 Téléchargements

Partager

Gmail Facebook X LinkedIn More