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Poster De Conférence Année : 2007

Porosity and structure evolution of a SiOCH low k material during post-etch cleaning process

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Matériaux
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Dates et versions

hal-00275109 , version 1 (22-04-2008)

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  • HAL Id : hal-00275109 , version 1

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W. Puyrenier, L. Broussous, D. Rebiscoul, V. Rouessac, A. Ayral. Porosity and structure evolution of a SiOCH low k material during post-etch cleaning process. 2007 MRS Spring Meeting, Apr 2007, San Franscico, United States. 2007. ⟨hal-00275109⟩
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