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Article Dans Une Revue Surface and Coatings Technology Année : 2007

Ferroelectric PbTiO3 films grown by pulsed liquid injection MOCVD

Résumé

The influence of deposition conditions (pressure, growth rate, solution concentration, etc.) on the growth of ferroelectric PbTiO3 (PTO) films by pulsed liquid injection MOCVD was examined. Pb(thd)2 and Ti(OiPr)2(thd)2 (thd = 2,2,6,6-tetramethyl-3,5-heptanedionate) dissolved in toluene were used as precursors. Films were grown on LaAlO3 (001) substrates for deposition process optimisation. PbTiO3/La1-xSrxMnO3/LaAlO3 heterostructures were elaborated at optimized deposition conditions. The microstructure of the heterostructures was characterized by X-ray Diffraction and by Raman spectroscopy. Pt/PbTiO3/La1-xSrxMnO3/LaAlO3 structures were used for ferroelectric, dielectric and piezoelectric characterisations of PTO films.
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Dates et versions

hal-00261249 , version 1 (06-03-2008)

Identifiants

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Ausrine Bartasyte, R. Bouregba, El Hadj Dogheche, Michel Boudard, G. Poullain, et al.. Ferroelectric PbTiO3 films grown by pulsed liquid injection MOCVD. Surface and Coatings Technology, 2007, 201, pp.9340. ⟨10.1016/j.surfcoat.2007.05.06⟩. ⟨hal-00261249⟩
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