Thermodynamical calculations on the chemical vapor transport of silicon carbide - Archive ouverte HAL
Article Dans Une Revue Materials Science and Engineering: B Année : 1999

Thermodynamical calculations on the chemical vapor transport of silicon carbide

Résumé

We have performed thermodynamical calculations in order to oversee the potential of a new method for growing silicon carbide: the chemical vapour transport process. In this way we have been able to select possible transporting agents and to show the nature of the deposits with varying parameters.

Domaines

Matériaux
Fichier non déposé

Dates et versions

hal-00186935 , version 1 (13-11-2007)

Identifiants

  • HAL Id : hal-00186935 , version 1

Citer

Didier Chaussende, Yves Monteil, Patrick Aboughe-Nze, Christian Brylinski, Jean Bouix. Thermodynamical calculations on the chemical vapor transport of silicon carbide. Materials Science and Engineering: B, 1999, 61-62, pp.98-101. ⟨hal-00186935⟩
45 Consultations
0 Téléchargements

Partager

More