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Article Dans Une Revue Journal of Vacuum Science and Technology Année : 2001

Silicon nitride as an effective protection against oxidation of a TiNi thin film in high temperature oxidizing air environment at atmospheric pressure

L. Buchaillot
X. Wallart
D. Collard
  • Fonction : Auteur
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Dates et versions

hal-00152461 , version 1 (07-06-2007)

Identifiants

  • HAL Id : hal-00152461 , version 1

Citer

I. Roch, L. Buchaillot, X. Wallart, D. Collard. Silicon nitride as an effective protection against oxidation of a TiNi thin film in high temperature oxidizing air environment at atmospheric pressure. Journal of Vacuum Science and Technology, 2001, B19, pp.305-307. ⟨hal-00152461⟩
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