Modeling and experimental validation of silicon nanotip oxidation : towards a nanoelectromechanical filter application
Résumé
This study aims at modeling the thermal oxidation of silicon pedestals leading to the formation of sharp silicon tips. The model is used to determine optimum process parameters taking into account the initial shape of the silicon pedestal shapes, and the geometry of the desired tip. Experimental validation has been performed for several initial silicon pedestal shapes at 1000/spl deg/C and 1100/spl deg/C under dry oxidation conditions, leading to formation of sharp silicon tips. The motivation of this study aims at designing and fabricating a nanoelectromechanical filter device. Its vibrating part consists in a silicon nanotip, covered with a thin gold layer, the geometrical features of which affect the center frequency of the nanofilter device.