Deep centers and negative temperature coefficient of the breakdown voltage of SiC p-n structures - Archive ouverte HAL
Article Dans Une Revue Semiconductors Année : 1997

Deep centers and negative temperature coefficient of the breakdown voltage of SiC p-n structures

Résumé

The temperature coefficient of the breakdown voltage of 6H-SiC p-n structures has been investigated. It is shown that the temperature dependence of the breakdown voltage can be explained by charge exchange on deep acceptor levels in the space charge layer. The computational results are in good agreement with the experimental data obtained for boron-doped 6H-SiC p-n structures. (C) 1997 American Institute of Physics.
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Dates et versions

hal-00141601 , version 1 (13-04-2007)

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  • HAL Id : hal-00141601 , version 1

Citer

A. A. Lebedev, S. Ortolland, Christophe Raynaud, Marie-Laure Locatelli, Dominique Planson, et al.. Deep centers and negative temperature coefficient of the breakdown voltage of SiC p-n structures. Semiconductors, 1997, 31 (7), pp.735-737. ⟨hal-00141601⟩
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