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Article Dans Une Revue Applied Surface Science Année : 2006

Transformation of hydrogen silsesquioxane properties with RIE plasma treatment for advanced multiple-gate MOSFETs

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hal-00138654 , version 1 (27-03-2007)

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  • HAL Id : hal-00138654 , version 1

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J. Penaud, F. Fruleux, Emmanuel Dubois. Transformation of hydrogen silsesquioxane properties with RIE plasma treatment for advanced multiple-gate MOSFETs. Applied Surface Science, 2006, 253, pp.395-399. ⟨hal-00138654⟩
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