Journal Articles
Materials Science and Engineering: C
Year : 2006
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https://hal.science/hal-00138653
Submitted on : Tuesday, March 27, 2007-10:22:57 AM
Last modification on : Friday, March 24, 2023-2:52:48 PM
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- HAL Id : hal-00138653 , version 1
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F. Fruleux, J. Penaud, Emmanuel Dubois, M. Francois, M. Muller. An optimal high contrast e-beam lithography process for the patterning of dense fin networks. Materials Science and Engineering: C, 2006, 26, pp.893-897. ⟨hal-00138653⟩
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