An optimal high contrast e-beam lithography process for the patterning of dense fin networks - Archive ouverte HAL Access content directly
Journal Articles Materials Science and Engineering: C Year : 2006

An optimal high contrast e-beam lithography process for the patterning of dense fin networks

J. Penaud
  • Function : Author
Emmanuel Dubois
M. Francois
  • Function : Author
M. Muller
  • Function : Author
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Dates and versions

hal-00138653 , version 1 (27-03-2007)

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  • HAL Id : hal-00138653 , version 1

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F. Fruleux, J. Penaud, Emmanuel Dubois, M. Francois, M. Muller. An optimal high contrast e-beam lithography process for the patterning of dense fin networks. Materials Science and Engineering: C, 2006, 26, pp.893-897. ⟨hal-00138653⟩
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