The effect of LaNiO3 bottom electrode thickness on ferroelectric and dielectric properties of (100) oriented PbZr0.53Ti0.47O3 films - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Journal of Crystal Growth Année : 2005

The effect of LaNiO3 bottom electrode thickness on ferroelectric and dielectric properties of (100) oriented PbZr0.53Ti0.47O3 films

Résumé

The (1 0 0) oriented LaNiO3 (LNO) films with different thickness were prepared on SiO2/Si substrate by a modified metallorganic decomposition process. PbZr0.53Ti0.47O3 (PZT) films (∼1 μm) subsequently deposited on LNO by modified sol–gel process. The X-ray diffraction measurements show PZT films exhibit a single perovskite phase with (1 0 0) preferred orientation. α1 0 0>94% can be obtained for PZT deposited on LNO bottom electrode with thickness greater than 60 nm. SEM measurements show the PZT films have a columnar structure. The LNO thickness effect on Pr, Ec, and dielectric constant were investigated and showed that the thickness of the LNO bottom electrode caused drastic changes in Pr, dielectric constant and dielectric loss. Sub-switching fields dependence of permittivity were investigated for PZT films and showed that both reverible and irreversible component of the permittivity increase with the thickness of LNO electrode.
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Dates et versions

hal-00130818 , version 1 (19-08-2022)

Licence

Paternité - Pas d'utilisation commerciale

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G.S. Wang, Denis Remiens, Caroline Soyer, El Hadj Dogheche, Eric Cattan. The effect of LaNiO3 bottom electrode thickness on ferroelectric and dielectric properties of (100) oriented PbZr0.53Ti0.47O3 films. Journal of Crystal Growth, 2005, 284 (1-2), pp.184-189. ⟨10.1016/j.jcrysgro.2005.07.014⟩. ⟨hal-00130818⟩
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