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Journal Articles Physical Review B: Condensed Matter and Materials Physics (1998-2015) Year : 2005

Role of steps in deposition rate in silane chemical vapor deposition on Si(111)

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hal-00015224 , version 1 (05-12-2005)

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  • HAL Id : hal-00015224 , version 1

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L. Masson, F. Thibaudau. Role of steps in deposition rate in silane chemical vapor deposition on Si(111). Physical Review B: Condensed Matter and Materials Physics (1998-2015), 2005, 71, pp.085314. ⟨hal-00015224⟩
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