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Article Dans Une Revue Journal of Applied Physics Année : 2002

SiO2-TiO2 interfaces studied by ellipsometry and X-ray photoemission spectroscopy

Résumé

We present an in situ study of the formation of the interfaces between TiO2 and SiO2 evaporated thin films using spectroscopic ellipsometry and X-ray photoemission spectroscopy (XPS). The growth of TiO2 on SiO2 was studied previously, but the reverse case has not received much attention up to now. In this article, we show that a common description is valid for both interfaces, which are formed by crosslinking Ti-O-Si bonds. We show also that the growth of TiO2 on SiO2 begins with an amorphous interface layer even when growth occurs at 400 degrees C. The interface is sharp, a few angstroms, as determined by angular XPS; when SiO2 grows on TiO2, the interface is thicker, about 10 AA. Roughness and interdiffusion play roles in interface formation and their role will be discussed.
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Dates et versions

hal-00002702 , version 1 (27-08-2004)

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Bruno Gallas, Aline Brunet-Bruneau, Serge Fisson, Gérard Vuye, Josette Rivory. SiO2-TiO2 interfaces studied by ellipsometry and X-ray photoemission spectroscopy. Journal of Applied Physics, 2002, 92 (4), pp.1922. ⟨10.1063/1.1494843⟩. ⟨hal-00002702⟩
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