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Article Dans Une Revue Journal of Materials Science Année : 2022

Effect of Co, Pd and Pt ultra-thin films on the Ni-silicide formation: investigating the sandwich configuration

Résumé

The effect of Co, Pd and Pt ultrathin films on the kinetics of the formation of Ni-silicide by reactive diffusion is investigated. 50 nm Ni/1 nm X/ 50 nm Ni (X = Co, Pd, Pt) deposited on Si(100) substrates are studied using in-situ and ex-situ measurements by X-ray diffraction (XRD). The presence of Co, Pd or Pt thin films in between the Ni layers delays the formation of the metal rich phase compared to the pure Ni/Si system and thus these films act as diffusion barriers. A simultaneous silicide formation (δ-Ni2Si and NiSi phases) different from the classic sequential formation is found during the consumption of the top Ni layer for which Ni has to diffuse through the barrier. A model for the simultaneous growth in the presence of a barrier is developed, and simulation of the kinetics measured by XRD is used to determine the permeability of the different barriers. Atom probe tomography (APT) of the Ni/Pd/Ni system shows that the Pd layer is located between the Ni top layer and δ-Ni2Si during the silicide growth, in accordance with a silicide formation controlled by Ni diffusion through the Pd layer. The effect of the barrier on the silicide formation and properties is discussed.

Domaines

Matériaux
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Dates et versions

hal-03863627 , version 1 (02-02-2023)

Identifiants

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Khalid Quertite, Jianbao Gao, Marion Descoins, Maxime Bertoglio, Christophe Girardeaux, et al.. Effect of Co, Pd and Pt ultra-thin films on the Ni-silicide formation: investigating the sandwich configuration. Journal of Materials Science, 2022, 57 (10), pp.5894-5912. ⟨10.1007/s10853-022-07012-2⟩. ⟨hal-03863627⟩
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