Forming Interconnects with Air Gaps
S.S. Choi
,
L.A Clevenger
,
Maxime Darnon
,
D.C. Edelstein
,
S.V. Nitta
,
et al.
Patent n° : US7,790,601B1 12/561,651. 2010
Patents
hal-00647715v1
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Reversing tone of patterns on integrated circuit and nanoscale fabrication
L.A. Clevenger
,
Maxime Darnon
,
A. D. Lisi
,
S. V. Nitta
Patent n° : US 8,183,694. 2012
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hal-00808853v1
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Method of patterning photosensitive material on a substrate containing a latent acid generator
Maxime Darnon
,
P. P. Joshi
,
Q. Lin
Patent n° : US 8,475,667. 2013
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hal-00925758v1
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Procédé d'élaboration sur un matériau diélectrique de nanofils en matériaux semi-conducteur connectant deux électrodes.
B. Salem
,
T. Baron
,
P. Gentile
,
P. Ferret
,
T. Ernst
France, Patent n° : Patent PA2541FR/ FR 2 924 108/ WO2009098398. 2009
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hal-00668079v1
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Contraintes mécaniques en micro, nano et optoélectronique
M. Mouis
éditions Hermès Science, pp.XX, 2006
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hal-00148998v1
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Interconnect structure fabricated without dry plasma etch processing
Maxime Darnon
,
J. P. Gambino
,
E. E. Huang
,
Q. Lin
Patent n° : US 8,298,937. 2012
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hal-00808851v1
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Selective etch back process for carbon nanotubes integration
Maxime Darnon
,
G.W. Gibson
,
P.P. Joshi
,
R.M. Martin
,
Y. Zang
Patent n° : US 8,449,781. 2013
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hal-00860918v1
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A rigorous analysis of the parameters which govern the SILC in n-channel MOSFET's with oxide thickness in the 1-2 nm range
D. Bauza
in 'MOSFETs: Properties, Preparations and Performance', Novapublishers, New York-USA (ISBN 978-1-60456-762-5). in 'MOSFETs: Properties, Preparations and Performance', Novapublishers, New York-USA (ISBN 978-1-60456-762-5), 2008
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hal-00391851v1
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Procédé de correction des effets de proximité électronique utilisant des fonctions de diffusion de type Voigt
J.H Tortai
,
P. Schiavone
,
T. Figueiro
,
N. Jedidi
N° de brevet: 12 53389. 2012
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hal-00807433v1
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Method for air gap interconnect integration using photo-patternable low k material
L.A. Clevenger
,
Maxime Darnon
,
Q. Lin
,
A. D. Lisi
,
S. V. Nitta
Patent n° : US 8,241,992. 2012
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hal-00808852v1
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Modélisation, caractérisation et mesures de circuits intégrés passifs RF
P. Saguet
Hermès, pp.XX, 2006
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hal-00149004v1
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Procédé de préparation d'une matrice en hydrogel par polymérisation.
A. Mgharbel
,
A. Nicolas
Patent n° : 1160874. 2011
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hal-00667186v1
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Procédé de gravure utilisant une structure de masquage multicouche
T. David
,
T. Chevolleau
,
G. Cunge
,
O. Joubert
Patent n° : 08 05022. 2008
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hal-00944884v1
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Method of patterning of magnetic tunnel junctions
O. Joubert
,
B. Schwarz
,
J. Pereira
,
K. Menguelti
,
E. Pargon
,
et al.
Patent n° : US 8,546,263,. 2013
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hal-00925756v1
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Optoélectronique térahertz
N. Breuil
,
Laurent Chusseau
,
J.-L. Coutaz
,
P. Crozat
,
J. Demaison
,
et al.
Coutaz, Jean-Louis. EDP Sciences, pp.360, 2008, 978-2-86883-975-6
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hal-00393993v1
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Process for making a gate for a short channel CMOS transistor structure
O. Joubert
,
G. Cunge
,
J. Foucher
,
D. Fuard
,
M. Bonvalot
,
et al.
Patent n° : WO0205336. 2004
Patents
hal-00944882v1
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Process for reversing tone of patterning on integrated circuit and structural process for nanoscale fabrication
L.A Clevenger
,
Maxime Darnon
,
A.D Lisi
,
S.N. Nitta
Patent n° : US 2011/0108989 A1 US7939446. 2011
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hal-00647704v1
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Electrokinetic Confinement of Neurite Growth for Dynamically Configurable Neural Networks
T. Honegger
,
J. Voldmann
,
D. Peyrade
Patent n° : 05910-01 N°61/752,183 M0925.70370US00. 2013
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hal-00936987v1
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Process for preparing a surface coated by crosslinked polyelectrolyte mulitlayer films as a biomimetic reservoir for proteins
C. Picart
,
T. Crouzier
Patent n° : WO2010081884. Copropriétaires : Grenoble INP/ Université de Montpellier. 2010
Patents
hal-00675127v1
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