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Document type : Conference papers
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Nanoimprint lithography: full wafer replication of nanometer features

R. Pelzer , C. Gourgon , S. Landis , P. Kettner
SPIE 2005, 2005, Sydney, Australia. pp.256-259, ⟨10.1117/12.582435⟩
Conference papers hal-00385937v1
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Study of 193-nm resist degradation under various etch chemistries

Arnaud Bazin , Michael May , Erwine Pargon , Bénédicte Mortini , Olivier Joubert
Advances in Resist Materials and Processing Technology XXIV, Feb 2007, San Jose, United States. ⟨10.1117/12.711415⟩
Conference papers hal-00384232v1
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Single Nanostructure Device fabricated by alternative technologies

J. Tallal , T. Pinedo-Rivera , K. Berton , D. Peyrade
EIPBN - The 51st EIPBN Electron, Ion, Photon Beam Technology and Nanofabrication, May 2007, Denver, United States
Conference papers hal-00394410v1
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ZnO nanowire-based radial structures for photovoltaic applications

Vincent Consonni , G. Rey , J. Bonaimé , N. Karst , B. Doisneau , et al.
NWG 2010 - 5th Nanowire Growth Workshop, Nov 2010, Rome, Italy
Conference papers hal-00807398v1
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Chamber walls coating during patterning of dielectric damascene structures with a metal hard mask: consequence on cleaning strategies

Thierry Chevolleau , Maxime Darnon , Thibaut David , Nicolas Possémé , Olivier Joubert
Plasma Etch and Strip in Microelectronics Workshop, 2007, Detroit, United States
Conference papers hal-00461598v1
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Emerging Nanotechnology for integration of Nanostructures in Nanoelectronic devices

Thierry Baron , Claire Agraffeil , Florian Dhalluin , Martin Kogelschtaz , Gilles Cunge , et al.
2009 Advanced Research Workshop (FTM-6) Future Trends in Microelectronics: Unmapped Roads, 2009, Sardinia, Italy. ⟨10.1002/9780470649343.ch14⟩
Conference papers hal-00461115v1
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Réalisation et caractérisation de cellules photovoltaïques

Anne Kaminski-Cachopo , Delphine Constantin , Loïc Vincent , Quentin Rafhay , Ahmad Bsiesy
12es Journées Pédagogiques du CNFM, Nov 2012, Saint-Malo, France. pp.59-64
Conference papers hal-00807271v1
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A Semi-Lumped Miniaturized Spurious Less Frequency Tunable Three-port Divider\Combiner with 20 dB Isolation Between Output Ports

A.L. Perrier , O. Exshaw , J.M. Duchamp , Philippe Ferrari
International Microwave Theory and Techniques Symposium, MTT-S, 2006, San Francisco, United States
Conference papers hal-00147888v1
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Bayesian Updating of Probabilistic Time-Dependent Fatigue Model: Application to Jacket Foundations of Wind Turbines

Benjamin Rocher , Franck Schoefs , Marc François , Arnaud Salou
EWSHM - 7th European Workshop on Structural Health Monitoring, IFFSTTAR, Inria, Université de Nantes, Jul 2014, Nantes, France
Conference papers hal-01021210v1
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Scaling-down lithographic dimensions with block-copolymer materials: 10nm-sized features with PS-b-PMMA

X. Chevalier , C. Nicolet , R. Tiron , A. Gharbi , M. Argoud , et al.
SPIE Advanced Lithography, 2013, San Diego, United States. ⟨10.1117/12.2011405⟩
Conference papers hal-00944986v1
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Etching Process Scalability and Challenges for ULK Materials

T. Chevolleau , N. Posseme , T. David , R. Bouyssou , J. Ducote , et al.
International Interconnect Technology Conference, IITC, Jun 2010, Dresde, Germany. ⟨10.1109/IITC.2010.5510735⟩
Conference papers hal-00625314v1
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OPC model error study through mask and SEM measurement error

Mame Kouna Top , David Fuard , Vincent Farys , Yorick Trouiller , Patrick Schiavone
Metrology, Inspection, and Process Control for Microlithography XXIV, Feb 2010, San Jose (CA), United States. in press
Conference papers hal-00462229v1
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Paving the way for multiple applications for the 3D-AFM technique in the semiconductor industry

J. Foucher , E. Pargon , M. Martin , S. Reyne , C. Dupré
SPIE 2008, 2008, San Jose, United States. pp.6922, ⟨10.1117/12.772675⟩
Conference papers hal-00384223v1
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Characterization of silicon etching in synchronized pulsed plasma

Maxime Darnon , M. Haass , G. Cunge , O. Joubert , S. Banna
SPIE Advanced Lithography, 2013, San Jose, United States. ⟨10.1117/12.2011462⟩
Conference papers hal-00860917v1
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Demolding strategy to improve the hot embossing throughput

Tanguy Lévéder , Stéfan Landis , Laurent Davoust , Sébastien Soulan , Nicolas Chaix
SPIE 6517 Advanced Lithography, 2007, San Jose, United States. ⟨10.1117/12.711151⟩
Conference papers hal-00266799v1
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In-line etching process control using dynamic scatterometry

S. Soulan , M. Besacier , T. Leveder , P. Schiavone
Modeling Aspects in Optical Metrology, 2007, Munich, Germany. pp.11111, ⟨10.1117/12.726197⟩
Conference papers hal-00168934v1
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Best focus shift mitigation for extending the depth of focus

Anna Szücs , Jonathan Planchot , Vincent Farys , Emek Yesilada , Clovis Alleaume , et al.
Advanced Lithography, SPIE 2013, Feb 2013, San Jose, United States. ⟨10.1117/12.2011114⟩
Conference papers hal-00941631v1
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Study of propagation modes of bent waveguides and micro-ring resonators by means of the Aperiodic Fourier Modal Method

D. Bucci , B. Martin , A. Morand
SPIE OPTO 2010, Jan 2010, San Francisco, CA, United States. pp.75970U, ⟨10.1117/12.840686⟩
Conference papers hal-00603655v1
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An inverse ellipsometric problem for thin film characterization: comparison of different optimization methods

Ayse Akbalik , Sébastien Soulan , Jean-Hervé Tortai , David Fuard , Issiaka Kone , et al.
Metrology, Inspection, and Process Control for Microlithography XXIII, Feb 2009, San Jose (CA), United States. in press, ⟨10.1117/12.814118⟩
Conference papers hal-00374509v1
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3D AFM Characterization of the Edge Roughness of Silicon High Q Resonators

P. Schiavone , M. Martin , P. Alipour , A.A Eftekhar , S. Yegnanarayanan , et al.
Conference on Lasers and Electro-Optics 2010, May 2010, San Jose (CA), United States
Conference papers hal-00462233v1
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Industrial characterization of scatterometry for advanced APC of 65 nm CMOS logic gate patterning

Karen Dabertrand , Mathieu Touchet , Stéphanie Kremer , Catherine Chaton , Maxime Gatefait , et al.
SPIE Advanced Lithography, 2008, San Jose, United States. ⟨10.1117/12.771614⟩
Conference papers hal-00462558v1
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LASTIC: a Light Aspiration device for in vivo Soft TIssue Characterization

Patrick Schiavone , Emmanuel Promayon , Yohan Payan
5th International Symposium on Biomedical Simulation ISBMS10, Jan 2010, Phoenix (AZ), United States. pp.1-10, ⟨10.1007/978-3-642-11615-5_1⟩
Conference papers hal-00439902v1
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Dynamic scatterometry for profile control during resist trimming process

Mohamed El Kodadi , Sébastien Soulan , Maxime Besacier , Patrick Schiavone
EIPBN 2009 - The 53rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, May 2009, Marco Island, United States
Conference papers hal-00461060v1
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3D nanofabrication by reverse contact UV nanoimprint lithography

N. Kehagias , V. Reboud , G. Chansin , M. Zelsmann , C. Jeppesen , et al.
MNC 2007 - International Microprocesses and Nanotechnology Conference, Nov 2007, Kyoto, Japan. pp.408-409, ⟨10.1109/IMNC.2007.4456277⟩
Conference papers hal-00394539v1
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Modelling of the Programming Window Distribution in Multi Nanocrystals Memories

Luca Perniola , Barbara De Salvo , Gérard Ghibaudo , Armando Foglio Para , Georges Pananakakis , et al.
ESSDERC, 2003, Lisbon, Portugal. ⟨10.1109/TNANO.2003.820782⟩
Conference papers hal-00485165v1