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Dielectrophoretic properties of engineered protein patterned colloidal particles

T. Honegger , D. Peyrade
Biomicrofluidics, 2012, pp.6(4) 044115. ⟨10.1063/1.4771544⟩
Journal articles hal-00808867v1

3D capillary force assembly: fabrication of white light emitters

J. Cordeiro , O. Lecarme , G. Osvaldo Dias , D. Peyrade
Journal of Vacuum Science and Technology, 2012, pp.B 30, 06F203. ⟨10.1116/1.4764090⟩
Journal articles hal-00808868v1

Engineering muscle tissues on microstructured polyelectrolyte multilayer films

C. Monge , K. Ren , K. Berton , R. Guillot , D. Peyrade , et al.
Tissue Engineering: Parts A, B, and C, 2012, pp.18(15-16):1664-76. ⟨10.1089/ten.tea.2012.0079⟩
Journal articles hal-00808870v1

Near-field interactions between a photonic crystal nanocavity and a near-field probe

L. Lalouat , B. Cluzel , K. Foubert , J. Dellinger , M. Ding , et al.
EOS European Optical Society Annual Meeting, Sep 2012, aberdeen, United Kingdom
Conference papers hal-00808892v1

Polymer photonic band-gaps fabricated by nanoimprint lithography

V. Reboud , T. Kehoe , J. Romero Vivas , N. Kehagias , M. Zelsmann , et al.
Photonics and Nanostructures - Fundamentals and Applications, 2012, vol. 10, p. 632
Journal articles hal-00808929v1

Large-scale processing and graphoepitaxy of PS-b-PDMS

M. Salaun , S. Vayssières , S. Archambault , M. Zelsmann
Workshop on Patterning by Self Assembly and Advanced Self Assembled materials for CMOS applications, Oct 2012, Intel Ireland, Leixlip, Ireland
Conference papers hal-00808933v1

Change in admittance of HfO2 Metal-Insulator-Metal (MIM) Capacitors after dc Bias Stress

O. Khaldi , P. Gonon , C. Mannequin , Corentin Vallée , F. Jomni , et al.
ECS Solid State Letters, 2013, 2 (5), pp.N1-N3
Journal articles hal-00908475v1

Evaluation of plasma parameters on PEALD deposited TaCN

Fabien Piallat , Virginie Beugin , Remy Gassilloud , Philippe Michallon , Laurent Dussault , et al.
Microelectronic Engineering, 2013, 107, pp.156-160. ⟨10.1016/j.mee.2012.08.020⟩
Journal articles hal-00908477v1

Impact of synchronized pulsed conditions on HBr cure to LWR reduction and etch resistance improvement of 193 nm photoresist

M. Brihoum , K. Menguelti , G. Cunge , E. Pargon , O. Joubert
Plasma Etch and Strip in Microelectronics (PESM), 5th International Workshop, Mar 2012, Grenoble, France
Conference papers hal-00808842v1

Lignes coplanaires à onde lente en technologie " circuit imprimé

D. Kaddour , Anne-Laure Franc , Emmanuel Pistono , P. Ferrari
Lignes coplanaires à onde lente en technologie " circuit imprimé ", May 2009, Grenoble, France
Conference papers hal-00603039v1

Characterization, modelling and simulation of Sub-45nm SOI devices

N. Rodriguez , F. Gámiz , S. Cristoloveanu
International Semiconductor Conference, Oct 2009, Sinaia, Romania. pp.57-63
Conference papers hal-00603670v1

High k SrTiO3 perovskite on Si/SiO2: CVD growth interface engineering and dielectric properties

C. Dubourdieu , O. Salicio , F. Ducroquet , I. Matko , D. Daniele
215th ECS Meeting, 10th Symposium on Silicon Nitride, Silicon Dioxide, and Alternate Emerging Dielectrics, Symp E5, #833, May 2009, San Francisco, United States. pp.669-684
Conference papers hal-00603690v1

Advanced analysis of silicon interface traps in MOSFET's with SiO2 and HfO2 as gate dielectrics

D. Bauza , O. Ghobar , N. Guenifi , S. Bayon
ECS Spring Meeting, May 2009, San Francisco, United States. pp.19-54
Conference papers hal-00603697v1

Comparison of short channel effect between SOI and sSOI triple-gate MOSFETs.

K.-Y. Na , S. Cristoloveanu , Y-H. Bae , W. Xiong , C.R. Cleavelin , et al.
Proc. in Silicon-on-Insulator Technology and Devices 14, (Y. Omura, S. Cristoloveanu, F. Gamiz, B-Y. Nguyen eds.), Pennington (USA), ECS Transactions, in press, May 2009, United States
Conference papers hal-00603703v1

A stacked SONOS technology, up to 4 levels and 6nm crystalline nanowires, with gate-all-around or independent gates (Φ-Flash), suitable for full 3D integration.

A. Hubert , Emmanuel Nowak , K. Tachi , V. Maffini-Alvaro , C. Vizioz , et al.
IEEE International Electron Devices Meeting, Baltimore,, Dec 2009, United States
Conference papers hal-00603802v1

First CMOS Integration of Ultra Thin Body and BOX (UTB2) Structures on Bulk Direct Silicon Bonded (DSB)

G. Bidal , F. Boeuf , S. Denorme , C. Laviron , K. Bourdelle , et al.
IEEE International Electron Devices, Dec 2009, Balitimore, United States
Conference papers hal-00603803v1

Impact de fortes contraintes mécaniques sur des nanostructures par intégration sur membranes ultra-fines

B. Bercu , L. Montès , F. Rochette , X. Xu , P. Morfouli
2ème Atelier GDR MECANO,, Apr 2010, Ecole des Mines de Paris, France
Conference papers hal-00604951v1

Extraction de la mobilité de magnétorésistance de nMOSFETs FD-SOI et sSOI courts à grille TiN/HfO2: discussion sur l'origine de sa dégradation

F. Rochette , M. Cassé , M. Mouis
Journées Transport balistique du GDR Nanoélectronique,, May 2009, Orsay, France
Conference papers hal-00604952v1

Drift-diffusion and Ballistic Mobility Characterization in Nano CMOS Devices

G. Ghibaudo , M. Mouis , L. Pham-Nguyen , K. Bennamane , I. Pappas , et al.
GDR Nanoélectronique, Atelier, De la réalité et de l'intérêt du transport balistique dans les composants nanoélectroniques, May 2009, Orsay, France
Conference papers hal-00604959v1

Enhanced model calibration for e-beam lithography: from pattern selection to parameter optimization

P. Schiavone , T. Figueiro , M. Saib , J.H Tortai , K.H Choi , et al.
10th Fraunhofer IISB Lithography Simulation Workshop, Sep 2012, Hersbruck, Germany
Conference papers hal-00807431v1

Nano Accumulation-Mode Suspended-Gate MOSFET: Impact of adhesion forces on electro-mechanical characteristics.

M. Collonge , M. Vinet , S. Deleonibus , G. Ghibaudo
IEEE ULIS conference, Udine, Italy, Mar 2008, Udine, Italy
Conference papers hal-00392458v1

Low-Temperature Electrical Characterization of eXtra-strained FD-SOI n-MOSFETs with TiN/HfO2 gate stack for the 32nm Technology Node.

S. Feruglio , F. Andrieu , O. Faynot , Patrick Garda , G. Ghibaudo
8th International Workshop on Low Temperature Electronics, WOLTE 8, Jena/Gabelbach, Germany, Jun 2008, Jena, Germany
Conference papers hal-00392485v1

Semi-analytical modeling of short channel effects in Si and Ge symmetrical double-gate MOSFETs

A. Tsormpatzoglou , C. Dimitriadis , R. Clerc , Q. Rafhay , G. Pananakakis , et al.
IEEE Transactions on Electron Devices, 2008, 54 (8), pp.1943-1946
Journal articles hal-00392897v1

A new characterization technique for SOI wafers: Split C(V) in pseudo-MOSFET configuration

A. Diab , C. Fernandez , A. Ohata , N. Rodriguez , I. Ionica , et al.
Solid-State Electronics, 2013, 90, pp.127-133. ⟨10.1016/j.sse.2013.02.041⟩
Journal articles hal-01001928v1

Impact of Ge proportion on advanced SiGe bulk P-MOSFET matching performances

L. Rahhal , A. Bajolet , C. Diouf , F. Kergomard , J. Rosa , et al.
Solid-State Electronics, 2013, 85, pp.15-22. ⟨10.1016/j.sse.2013.03.001⟩
Journal articles hal-01001970v1

Dual wavelength cw microlaser for the generation of THz radiation

F. Pallas , E. Hérault , G. Grosa , J.-F. Roux , J.-L. Coutaz , et al.
"Dual wavelength cw microlaser for the generation of THz radiation", Sep 2010, Rome, Italy
Conference papers hal-00603246v1

Spurious Supression Semi-lumped UWB Bandpass Filter

D. Kaddour , Jean-Daniel Arnould , P. Ferrari
"Spurious Supression Semi-lumped UWB Bandpass Filter, Nov 2009, Toulouse, France
Conference papers hal-00602876v1

Microwave characterization of porous SiOCH permittivity after integration dedicated to the 32 nm node

B. Blampey , M. Gallitre , A. Farcy , T. Lacrevaz , S. de Rivaz , et al.
Microwave characterization of porous SiOCH permittivity after integration dedicated to the 32 nm node, Mar 2009, Grenoble, France
Conference papers hal-00602820v1

Modeling and Characterization of Superconducting MEMS Microwaves Applications in Radioastronomy

N. Al Cheikh , P. Xavier , J.-M. Duchamp
Modeling and Characterization of Superconducting MEMS Microwaves Applications in Radioastronomy, Mar 2009, Agadir, Morocco
Conference papers hal-00602834v1

Optical Techniques for Up-Conversion of MB-OFDM Signals in 60 GHz band using Fiber Bragg Grating

G. Nguyen , V. Dobremez , B. Cabon , Yannis Le Guennec
Optical Techniques for Up-Conversion of MB-OFDM Signals in 60 GHz band using Fiber Bragg Grating, Jun 2009, Dresde, Germany
Conference papers hal-00602846v1