Physical and Electrical Properties of Thin Doped Silicon Films Obtained by Low Temperature Smart Cut and Solid Phase Epitaxy - FMNT - Fédération Micro- et Nano- Technologies Accéder directement au contenu
Article Dans Une Revue ECS Journal of Solid State Science and Technology Année : 2013

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hal-00991672 , version 1 (15-05-2014)

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G. Gaudin, W. van den Daele, N. Chartrain, G. Riou, C. Veytizou, et al.. Physical and Electrical Properties of Thin Doped Silicon Films Obtained by Low Temperature Smart Cut and Solid Phase Epitaxy. ECS Journal of Solid State Science and Technology, 2013, 2 (12), pp.P534-P538. ⟨10.1149/2.012312jss⟩. ⟨hal-00991672⟩
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