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Growth of high dielectric constant TiO2 films in capacitors using a low temperature ALD process

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hal-00908485 , version 1 (23-11-2013)

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  • HAL Id : hal-00908485 , version 1

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J. Pointet, A. Bsiesy, P. Gonon, Corentin Vallée, B. Fléchet. Growth of high dielectric constant TiO2 films in capacitors using a low temperature ALD process. E-MRS 2013 Spring Meeting, May 2013, Strasbourg, France. ⟨hal-00908485⟩
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