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https://hal.science/hal-00908485
Submitted on : Saturday, November 23, 2013-4:24:21 PM
Last modification on : Wednesday, October 20, 2021-3:47:03 AM
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- HAL Id : hal-00908485 , version 1
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J. Pointet, A. Bsiesy, P. Gonon, Corentin Vallée, B. Fléchet. Growth of high dielectric constant TiO2 films in capacitors using a low temperature ALD process. E-MRS 2013 Spring Meeting, May 2013, Strasbourg, France. ⟨hal-00908485⟩
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