Characterization of Plasma-Induced Damages on low-k during Interconnection Integration by Scatterometric Porosimetry - FMNT - Fédération Micro- et Nano- Technologies Accéder directement au contenu
Communication Dans Un Congrès Année : 2011
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hal-00647640 , version 1 (02-12-2011)

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  • HAL Id : hal-00647640 , version 1

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R. Hurand, Maxime Darnon, T. Chevolleau, D. Fuard, F. Bailly, et al.. Characterization of Plasma-Induced Damages on low-k during Interconnection Integration by Scatterometric Porosimetry. AVS 58h international symposium, Oct 2011, Nashville, United States. ⟨hal-00647640⟩
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