Journal Articles
Journal of Applied Physics
Year : 2004
Marielle Clot : Connect in order to contact the contributor
https://hal.science/hal-00390405
Submitted on : Tuesday, June 2, 2009-9:49:37 AM
Last modification on : Wednesday, March 9, 2022-9:28:49 AM
Dates and versions
Identifiers
- HAL Id : hal-00390405 , version 1
Cite
C. Durand, C. Dubourdieu, Corentin Vallée, V. Loup, M. Bonvalot, et al.. Microstructure and electrical characterizations of yttrium oxide and yttrium silicate thin films deposited by pulsed liquid-injection plasma-enhanced metal-organic chemical vapor deposition. Journal of Applied Physics, 2004, pp.96 (2004) 1719-1729. ⟨hal-00390405⟩
76
View
0
Download