Microstructure and electrical characterizations of yttrium oxide and yttrium silicate thin films deposited by pulsed liquid-injection plasma-enhanced metal-organic chemical vapor deposition - Archive ouverte HAL Access content directly
Journal Articles Journal of Applied Physics Year : 2004

Microstructure and electrical characterizations of yttrium oxide and yttrium silicate thin films deposited by pulsed liquid-injection plasma-enhanced metal-organic chemical vapor deposition

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hal-00390405 , version 1 (02-06-2009)

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  • HAL Id : hal-00390405 , version 1

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C. Durand, C. Dubourdieu, Corentin Vallée, V. Loup, M. Bonvalot, et al.. Microstructure and electrical characterizations of yttrium oxide and yttrium silicate thin films deposited by pulsed liquid-injection plasma-enhanced metal-organic chemical vapor deposition. Journal of Applied Physics, 2004, pp.96 (2004) 1719-1729. ⟨hal-00390405⟩
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