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Conference Papers Year : 2005

Nanoimprint lithography: full wafer replication of nanometer features

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Abstract

Nanoimprint Lithography (NIL) is a fast, high resolution replication technology for micromechanics, microbiology and even for microelectronic applications in the sub-100nm range. The technique has been demonstrated to be a very promising next generation technique for large-area structure replication up to wafer-level in the micrometer and nanometer scale. For producing nanometer structures the capital investments required are much lower compared to other next generation methods (e-beam writing, x-ray lithography, EUV lithography, ...). Nanoimprint Lithography is based on two different techniques: Hot Embossing (HE) and UV-Nanoimprint Lithography (UV-NIL). Both methods can be used for replicating dense and isolated features in the range of 70nm to 100μm simultaneously on up to 200mm wafers.
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Dates and versions

hal-00385937 , version 1 (10-03-2020)

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Attribution - CC BY 4.0

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R. Pelzer, C. Gourgon, S. Landis, P. Kettner. Nanoimprint lithography: full wafer replication of nanometer features. SPIE 2005, 2005, Sydney, Australia. pp.256-259, ⟨10.1117/12.582435⟩. ⟨hal-00385937⟩
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